GROWTH AND CHARACTERIZATION OF ZNO FILMS DEPOSITED ON A MONOLITHIC SI3N4-SIO2-SI CONFIGURATION

被引：3

作者：

PANWAR, BS

BHATTACHARYYA, AB

NAGPAL, KC

MALL, RP

机构：

[1] NATL PHYS LAB,NEW DELHI 110012,INDIA

[2] DEF SCI CTR,DELHI,INDIA

来源：

THIN SOLID FILMS | 1989年 / 168卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90014-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：291 / 305

页数：15

共 33 条

[1] THE EFFECT OF O-2 ON REACTIVELY SPUTTERED ZINC-OXIDE [J].

AITA, CR ;

PURDES, AJ ;

LAD, RJ ;

FUNKENBUSCH, PD .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) :5533-5536

[2] THE EFFECT OF RF POWER ON REACTIVELY SPUTTERED ZINC-OXIDE [J].

AITA, CR ;

LAD, RJ ;

TISONE, TC .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) :6405-6410

[3] GENERAL FORMALISM FOR QUANTITATIVE AUGER ANALYSIS [J].

CHANG, CC .

SURFACE SCIENCE, 1975, 48 (01) :9-21

[4]

CHERNE RD, 1982, IEEE ULTRASONICS S P, P334

[5]

CHUBACHI N, 1974, JPN J APPL PHYS PT 1, V2, P737

[6] FABRICATION-RELATED EFFECTS IN METAL-ZNO-SIO2-SI STRUCTURES [J].

CORNELL, ME ;

ELLIOTT, JK ;

GUNSHOR, RL ;

PIERRET, RF .

APPLIED PHYSICS LETTERS, 1977, 31 (09) :560-562

[7] C-AXIS ORIENTATION OF SPUTTERED ZNO FILMS [J].

DYBWAD, GL .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) :5192-&

[8] CRYSTALLOGRAPHIC ORIENTATION OF ZINC OXIDE FILMS DEPOSITED BY TRIODE SPUTTERING [J].

FOSTER, NF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01) :111-&

[9] ELECTRON-BEAM-INDUCED-CURRENT INVESTIGATIONS ON MOS AND MNOS DEVICES [J].

HEZEL, R .

SOLID-STATE ELECTRONICS, 1979, 22 (08) :735-&

[10]

HICKERNELL FJ, 1977, IEEE ULTRASONICS S P, P309

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