CHARACTERIZATION OF A NATURAL BARRIER IN AN AU/BA1-XKXBIO3 JUNCTION

被引：8

作者：

SUZUKI, S

SUZUKI, H

IYORI, M

TAKAHASHI, K

USUKI, T

YOSHISATO, Y

机构：

[1] Functional Materials Research Center, SANYO Electric Co. Ltd, Osaka, 573

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 12A期

关键词：

BA(1-X)K(X)BIO3; X-RAY PHOTOELECTRON SPECTROSCOPY; NATURAL BARRIER; TUNNEL JUNCTION; OHMIC CONTACT; JUNCTION RESISTIVITY;

D O I：

10.1143/JJAP.31.3834

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

X-ray photoelectron spectroscopy (XPS) has revealed that the ''natural barrier'' on a Ba1-XKXBiO3 (BKBO) thin-film surface is composed of a K-compound layer and a nonstoichiometric layer resulting from Ba depletion. An Au/BKBO junction was fabricated at various temperatures, and its electrical properties were investigated. Junction resistivity could be reproducibly controlled between 10(-1) and 10(-5) OMEGA.cm2 by varying the temperature of Au deposition between room temperature (RT) and 300-degrees-C. The decrease in junction resistivity with increasing Au-deposition temperature was found to be a result of decomposition of the K-compound layer and rearrangement of the nonstoichiometric layer by annealing the BKBO film.

引用

收藏

页码：3834 / 3838

页数：5

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