ELECTROCHEMICAL STUDIES ON COCR FILMS AS A FUNCTION OF SUBSTRATE-TEMPERATURE AND POST-DEPOSITION HEAT-TREATMENT

被引：2

作者：

FARTASH, A ^{[1
]}

OESTERREICHER, H ^{[1
]}

机构：

[1] UNIV CALIF SAN DIEGO,DEPT CHEM,LA JOLLA,CA 92093

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 07期

关键词：

D O I：

10.1063/1.344121

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3282 / 3285

页数：4

共 9 条

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[7]

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[8] CHEMICAL-STABILITY AND MICROSTRUCTURE ON SPUTTERED COCR PERPENDICULAR MEDIA [J].

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[9] CORROSION BEHAVIOR OF COCR FILMS IN SULFURIC-ACID [J].

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