THE INFLUENCE OF DEPOSITION CONDITIONS ON HYDROGEN-BOND CONFIGURATION AND TRAP SITES IN SPUTTERED SI3N4

被引:1
作者
ANDERSON, HM [1 ]
MARTIN, PM [1 ]
机构
[1] PACIFIC NW LAB, RICHLAND, WA 99352 USA
关键词
D O I
10.1149/1.2113998
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:978 / 979
页数:2
相关论文
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