EXTENDING THE LIFETIME OF OPTICAL LITHOGRAPHY TECHNOLOGIES WITH WAVE-FRONT ENGINEERING

被引：39

作者：

LEVENSON, MD

机构：

[1] Optics Consultant, Saratoga, CA, 95070

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 12B期

关键词：

PHOTOLITHOGRAPHY; PHASE-SHIFTING MASK; OFF-AXIS ILLUMINATION; OPTICAL PROXIMITY CORRECTION; SEMICONDUCTOR MANUFACTURING;

D O I：

10.1143/JJAP.33.6765

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Various types of phase shifting mask, off-axis illumination, optical proximity correction and other innovations promise to extend the lifetime of i-line (365 nm) and deep ultra-violet (DUV) optical lithography technologies into the subhalf-micron era. No single innovation seems likely to produce a patterning paradigm that lasts more than one generation, but engineering solutions using combinations of new options and familiar technologies may make optical technology viable well into the next century.

引用

页码：6765 / 6773

页数：9

共 13 条

[1] FABRICATION OF GROOVED GLASS SUBSTRATES BY PHASE MASK LITHOGRAPHY [J].

BROCK, PJ ;

LEVENSON, MD ;

ZAVISLAN, JM ;

LYERLA, JR ;

CHENG, JC ;

PODLOGAR, CV .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3155-3161

[2]

BRUNNER TA, 1993, P SOC PHOTO-OPT INS, V1927, P54, DOI 10.1117/12.150474

[3]

BUDD RA, 1994, P SOC PHOTO-OPT INS, V2197, P530, DOI 10.1117/12.175448

[4]

HERSHEL R, 1987, VLSI ELECTRONICS MIC, V6, P20

[5]

JEONG HJ, 1994, SOLID STATE TECHNOL, V37, P39

[6]

LAVOY R, COMMUNICATION

[7] WAVE-FRONT ENGINEERING FOR PHOTOLITHOGRAPHY [J].

LEVENSON, MD .

PHYSICS TODAY, 1993, 46 (07) :28-36

[8]

LIN BJ, 1993, P SOC PHOTO-OPT INS, V1927, P89, DOI 10.1117/12.150417

[9]

NOGUCHI M, 1992, P SOC PHOTO-OPT INS, V1674, P92, DOI 10.1117/12.130312

[10] 1/8 MU-M OPTICAL LITHOGRAPHY [J].

OWEN, G ;

PEASE, RFW ;

MARKLE, DA ;

GRENVILLE, A ;

HSIEH, RL ;

VONBUNAU, R ;

MALUF, NI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06) :3032-3036

← 1 2 →