XENON FLUORIDE LASER EXCITATION BY TRANSVERSE ELECTRIC-DISCHARGE

被引：87

作者：

BURNHAM, R

HARRIS, NW

DJEU, N

机构：

[1] SCI APPLICATIONS INC,ALEXANDRIA,VA 22202

[2] USN,RES LAB,LASER PHYS BRANCH,WASHINGTON,DC 20375

来源：

关键词：

D O I：

10.1063/1.88649

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：86 / 87

页数：2

共 8 条

[1] HIGH-POWER XENON FLUORIDE LASER [J].

AULT, ER ;

BRADFORD, RS ;

BHAUMIK, ML .

[2] EMISSION-SPECTRUM OF XEI IN ELECTRON-BEAM-EXCITED XE-I2 MIXTURES [J].

EWING, JJ ;

BRAU, CA .

PHYSICAL REVIEW A, 1975, 12 (01) :129-132

[3] LASER ACTION ON SIGMA-2+1-2 -] SIGMA-2+1-2 BANDS OF KRF AND XECL [J].

EWING, JJ ;

BRAU, CA .

[4]

MANGANO JA, UNPUBLISHED

[5]

SCHENCK P, 1973, APPL OPT, V12, P94

[6] STIMULATED EMISSION AT 281.8 NM FROM XEBR [J].

SEARLES, SK ;

HART, GA .

[7]

TISONE GC, 2ND P ANN C EL STAT

[8]

VALAZCO JE, 1975, J CHEM PHYS, V62, P1991