SELF-CONSISTENT SIMULATION OF A PARALLEL-PLATE RF DISCHARGE

[1] LARGE-SIGNAL TIME-DOMAIN MODELING OF LOW-PRESSURE RF GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) : 81 - 89

[2] Brewer A. K., 1937, J APPL PHYS, V8, P779

[3] Brown S. C., 1959, BASIC DATA PLASMA PH

[4] EFFECTS OF FREQUENCY ON OPTICAL-EMISSION, ELECTRICAL, ION, AND ETCHING CHARACTERISTICS OF A RADIO-FREQUENCY CHLORINE PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) : 2135 - 2144

[5] REFLECTION OF VERY SLOW ELECTRONS [J]. PHYSICAL REVIEW, 1958, 111 (01): : 103 - 112

[6] MECHANISMS FOR POWER DEPOSITION IN AR/SIH4 CAPACITIVELY COUPLED RF DISCHARGES [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) : 188 - 196

[7] MOREY IJ, 1986, THESIS AUSTR NATIONA

[1] LARGE-SIGNAL TIME-DOMAIN MODELING OF LOW-PRESSURE RF GLOW-DISCHARGES [J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) : 81 - 89

[2] Brewer A. K., 1937, J APPL PHYS, V8, P779

[3] Brown S. C., 1959, BASIC DATA PLASMA PH

[4] EFFECTS OF FREQUENCY ON OPTICAL-EMISSION, ELECTRICAL, ION, AND ETCHING CHARACTERISTICS OF A RADIO-FREQUENCY CHLORINE PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (06) : 2135 - 2144

[5] REFLECTION OF VERY SLOW ELECTRONS [J]. PHYSICAL REVIEW, 1958, 111 (01): : 103 - 112

[6] MECHANISMS FOR POWER DEPOSITION IN AR/SIH4 CAPACITIVELY COUPLED RF DISCHARGES [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1986, 14 (02) : 188 - 196

[7] MOREY IJ, 1986, THESIS AUSTR NATIONA