PLASMA CHARACTERISTICS AND ETCH UNIFORMITY IN CF4 MAGNETRON ETCHING USING AN ANNULAR PERMANENT-MAGNET

被引：30

作者：

KINOSHITA, H

ISHIDA, T

OHNO, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 10期

关键词：

D O I：

10.1063/1.339100

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4269 / 4272

页数：4

共 10 条

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