DEPOSITION AND PROPERTIES OF DIAMOND THIN-FILMS

被引：5

作者：

KLAGES, CP

机构：

[1] Fraunhofer-Institut für Schicht- und Oberflächentechnik, W-2000 Hamburg 54

来源：

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 140卷

关键词：

D O I：

10.1016/0921-5093(91)90506-I

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Owing to a combination of several excellent intrinsic properties, diamond is the ideal material for a wide range of technical applications, from cutting tool coatings to high power, high temperature semiconductor devices. More than 20 years after Eversole's demonstration of the feasibility of diamond growth under conditions of thermodynamic metastability, intensive world-wide research activities emerged, aiming at the development and improvement of processes for the deposition of diamond thin films. This paper ives a short account of the important deposition methods known at present and discusses, as examples, several film properties and applications.

引用

页码：741 / 746

页数：6

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