ELECTRODE KINETIC PARAMETERS FOR COPPER DEPOSITION ON CLEAN AND SOILED COPPER CATHODES

被引：15

作者：

KARASYK, L

LINFORD, HB

机构：

来源：

关键词：

D O I：

10.1149/1.2425896

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：895 / 904

页数：10

共 27 条

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[9]

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[10]

LINFORD HB, 1951, PLATING, V38, P158