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DECOMPOSITION OF NO ON AG(111) AT LOW-TEMPERATURES

被引：110
作者：
BEHM, RJ [1 ]
BRUNDLE, CR [1 ]
机构：
[1] IBM CORP,RES LAB,SAN JOSE,CA 95193
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期
关键词：
D O I：
10.1116/1.572671
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1040 / 1041
页数：2
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