CONTROL OF SENSITIVITY TO HOLOGRAM STORAGE IN LINBO3 USING AN ACCESSORY PHOTOVOLTAIC CRYSTAL

被引:3
作者
HUIGNARD, JP [1 ]
MICHERON, F [1 ]
机构
[1] THOMSON CSF,DOMAINE CORBEVILLE,91401 ORSAY,FRANCE
关键词
D O I
10.1016/0030-4018(76)90055-9
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
引用
收藏
页码:80 / 82
页数:3
相关论文
共 8 条
[1]   HOLOGRAPHIC STORAGE IN LITHIUM NIOBATE [J].
CHEN, FS ;
LAMACCHIA, JT ;
FRASER, DB .
APPLIED PHYSICS LETTERS, 1968, 13 (07) :223-+
[2]   HIGH-VOLTAGE BULK PHOTOVOLTAIC EFFECT AND THE PHOTOREFRACTIVE PROCESS IN LINBO3 [J].
GLASS, AM ;
LINDE, DVD ;
NEGRAN, TJ .
APPLIED PHYSICS LETTERS, 1974, 25 (04) :233-235
[3]   COHERENT SELECTIVE ERASURE OF SUPERIMPOSED VOLUME HOLOGRAMS IN LINBO3 [J].
HUIGNARD, JP ;
HERRIAU, JP ;
MICHERON, F .
APPLIED PHYSICS LETTERS, 1975, 26 (05) :256-258
[4]  
HUIGNARD JP, 1975, JUN IEEE S APPL FERR
[5]  
KURZ H, 1975, JUN IEEE S APPL FERR
[6]   CONTROL OF OPTICAL DAMAGE IN REDUCED LINBO3 BY EXTERNAL APPLIED FIELD [J].
OHMORI, Y ;
YASOJIMA, Y ;
INUISHI, Y .
APPLIED PHYSICS LETTERS, 1974, 25 (12) :716-717
[7]   CONTROL OF SUSCEPTIBILITY OF LITHIUM NIOBATE TO LASER-INDUCED REFRACTIVE INDEX CHANGES [J].
PETERSON, GE ;
GLASS, AM ;
NEGRAN, TJ .
APPLIED PHYSICS LETTERS, 1971, 19 (05) :130-&
[8]  
PHILLIPS W, 1972, RCA REV, V33, P94