MODELING OF REFRACTIVE-INDEX PROFILES OF HE+ ION-IMPLANTED KNBO3 WAVE-GUIDES BASED ON THE IRRADIATION PARAMETERS

被引：71

作者：

FLUCK, D ^{[1
]}

JUNDT, DH ^{[1
]}

GUNTER, P ^{[1
]}

FLEUSTER, M ^{[1
]}

BUCHAL, C ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH, FORSCHUNGSZENTRUM, INST SCHICHT & IONENTECH, W-5170 JULICH 1, GERMANY

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 74卷 / 10期

关键词：

D O I：

10.1063/1.355217

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Planar optical waveguides were fabricated by He+ ion implantation in KNbO3 crystals with doses from 2.5 x 10(14) to 1 x 10(16) cm-2 and energies from 1 to 3.5 MeV, and the index profiles were analyzed. A comparison with theoretical radiation damage profiles calculated by the TRIM code indicates that the index change is mainly caused by nuclear collisions. However, at higher implantation doses the influence of the electronic excitation on the refractive index profiles cannot be neglected. A method is derived to predict the index profile of n(b) from the He+ implantation parameters energy and dose. The measured mode spectra of waveguides produced by single and dual energy implantation are in excellent agreement with the predicted spectra.

引用

页码：6023 / 6031

页数：9

共 31 条

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