STEPS TOWARDS THE USE OF SILICON DRIFT DETECTORS IN HEAVY-ION COLLISIONS AT LHC

被引:13
作者
BEOLE, S
BURGER, P
CANTATORE, E
CASSE, G
CORSI, F
CUOMO, M
DABROWSKI, W
DEVENUTO, D
GIUBELLINO, P
GRAMEGNA, G
MANZARI, V
MARZOCCA, C
NAVACH, F
PORTACCI, G
RICCATI, L
VACCHI, A
机构
[1] IST NAZL FIS NUCL,I-10125 TURIN,ITALY
[2] CANBERRA SEMICOND NV,B-2250 OLEN,BELGIUM
[3] POLITECN BARI,DIPARTIMENTO ELETTROTECN & ELETTRON,BARI,ITALY
[4] IST NAZL FIS NUCL,I-70126 BARI,ITALY
[5] UNIV BARI,DIPARTMENTO FIS,BARI,ITALY
[6] UNIV TRIESTE,DIPARTMENTO FIS,I-34127 TRIESTE,ITALY
[7] IST NAZL FIS NUCL,TRIESTE,ITALY
[8] ACAD MIN & MET,FAC PHYS & NUCL TECH,KRAKOW,POLAND
关键词
D O I
10.1016/0168-9002(94)01223-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The inner tracking system of the ALICE detector for Pb-Pb collisions at the LHC require a very good granularity in the innermost planes, due to the high particle density, up to 8000 particles per unit of rapidity. The silicon drift detectors are a very good candidate for this application, but up to now no large system using this technology has been industrially produced and operated in experiments. One of the first steps towards large scale production is the study of the doping uniformity in commercially available Si wafers. The understanding of doping fluctuations is of fundamental importance since they introduce deviations of the electron trajectories from the expected ones. In addition, it is also necessary to know the changes possibly introduced by different processing steps in the resistivity profiles. We report here the results of measurements of resistivity profiles for NTD silicon wafers both before and after processing.
引用
收藏
页码:67 / 70
页数:4
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