INCREASED PRECISION IN STRAIN-MEASUREMENT OF DIAMOND BY MICRORAMAN SPECTROSCOPY

被引:7
作者
ALEXANDER, WB [1 ]
HOLLOWAY, PH [1 ]
SIMMONS, J [1 ]
OCHOA, R [1 ]
机构
[1] TRENTON STATE COLL,TRENTON,NJ 08625
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1994年 / 12卷 / 05期
关键词
D O I
10.1116/1.578973
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
MicroRaman spectroscopy has been used to measure stress in diamond with improved precision. Stress was induced by rf sputter deposited tungsten films of 1- and 9-mum thickness. Preliminary data showed a systematic error in the diamond Raman peak position of about 0.05 cm-1/scan, which led to inaccurate and imprecise stress measurement. A new technique, using a reference 5520-angstrom krypton line only 10.5 cm-1 from the Raman diamond line, results in an order of magnitude increase in measurement precision. Using this calibration, diamond peak position could be measured with a precision of +/-0.03 cm-1 which corresponds to +/-11 MPa of stress. This is an easy and inexpensive means to improve stress measurements in diamond by microRaman spectroscopy.
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页码:2943 / 2945
页数:3
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