GROWTH-PATTERN OF SILICON CLUSTERS

被引:10
作者
BAHEL, A [1 ]
PAN, J [1 ]
RAMAKRISHNA, MV [1 ]
机构
[1] NYU,DEPT PHYS,NEW YORK,NY 10003
来源
MODERN PHYSICS LETTERS B | 1995年 / 9卷 / 13期
关键词
D O I
10.1142/S0217984995000759
中图分类号
O59 [应用物理学];
学科分类号
摘要
Tight-binding molecular dynamics simulated annealing technique is employed to search for the ground state geometries of silicon clusters containing 11-17 atoms. These studies revealed that layer formation is the dominant growth pattern in all these clusters. Fullerene-like precursor structures consisting of fused pentagon rings are also observed. The atoms in ail these clusters exhibit pronounced preference for residing on the surface.
引用
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页码:811 / 816
页数:6
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