FLUX FLOW RESISTIVITY OF SUPERCONDUCTING THIN-FILM

被引：17

作者：

TAKAYAMA, T ^{[1
]}

机构：

[1] KYUSHU UNIV, FAC SCI, DEPT PHYS, FUKUOKA 812, JAPAN

来源：

JOURNAL OF LOW TEMPERATURE PHYSICS | 1977年 / 27卷 / 3-4期

关键词：

D O I：

10.1007/BF00655279

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：359 / 396

页数：38

共 63 条

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[10]

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