INHIBITION OF THE UNDERPOTENTIAL DEPOSITION OF COPPER ON SINGLE CRYSTALLINE PLATINUM SURFACES

The process of underpotential deposition (UPD) of copper on Pt(111), Pt(100) and Pt(110) single crystalline surfaces changes upon the addition of inhibitors such as thiourea and dithiadecyldisodium-sulphonate to the electrolyte. The specific nature of cyclic voltammograms disappears and a new pattern with similar features for all Pt surfaces is generated. This holds also for polycrystalline Pt electrodes subjected to the same procedure. A scheme of the UPD layer that forms on inhibited surfaces is suggested.