TIME-RESOLVED X-RAY-DIFFRACTION MEASUREMENT OF THE TEMPERATURE AND TEMPERATURE-GRADIENTS IN SILICON DURING PULSED LASER ANNEALING

被引：66

作者：

LARSON, BC

WHITE, CW

NOGGLE, TS

BARHORST, JF

MILLS, DM

机构：

[1] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14850

[2] CORNELL UNIV,HIGH ENERGY SYNCHROTRON SOURCE,ITHACA,NY 14850

来源：

关键词：

D O I：

10.1063/1.93880

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：282 / 284

页数：3

共 6 条

[1]

COMPAAN A, 1982, LASER ELECTRON BEAM, P73

[2] DYNAMICAL NEUTRON-DIFFRACTION BY IDEALLY CURVED CRYSTALS [J].

KLAR, B ;

RUSTICHE.F .

NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA B-GENERAL PHYSICS RELATIVITY ASTRONOMY AND MATHEMATICAL PHYSICS AND METHODS, 1973, B 13 (02) :249-271

LARSON, BC ;

WHITE, CW ;

NOGGLE, TS ;

MILLS, D .

LARSON, BC ;

BARHORST, JF .

[5]

LOWNDES DH, PHYS REV

[6]

TOULOUKIAN YS, 1970, THERMOPHYSICAL PROPE, V13, P155