ION-BEAM-ENHANCED ADHESION OF AU FILMS ON SI AND SIO2

被引：12

作者：

BERKOWITZ, AE ^{[1
]}

BENENSON, RE ^{[1
]}

FLEISCHER, RL ^{[1
]}

WIELUNSKI, L ^{[1
]}

LANFORD, WA ^{[1
]}

机构：

[1] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1985年 / 7-8卷 / MAR期

关键词：

D O I：

10.1016/0168-583X(85)90487-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：877 / 880

页数：4

共 7 条

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[2]

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[3]

Northcliffe L. S., 1970, NUCL DATA A, V7, P233

[4]

PRIMAK W, 1975, COMPACTION STATES VI

[5]

SMITH B, 1977, ION IMPLANTATION RAN

[6] SURFACE MODIFICATION USING MEV ION-BEAMS [J].

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[7] ENHANCED ADHESION FROM HIGH-ENERGY ION IRRADIATION [J].

WERNER, BT ;

VREELAND, T ;

MENDENHALL, MH ;

QUI, Y ;

TOMBRELLO, TA .

THIN SOLID FILMS, 1983, 104 (1-2) :163-166

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