THE INFLUENCE OF HALIDE-IONS AT SUBMONOLAYER LEVELS ON THE FORMATION OF OXIDE LAYER AND ELECTRODISSOLUTION OF COPPER IN NEUTRAL SOLUTIONS

被引：45

作者：

ELSNER, CI

SALVAREZZA, RC

ARVIA, AJ

机构：

来源：

ELECTROCHIMICA ACTA | 1988年 / 33卷 / 12期

关键词：

D O I：

10.1016/0013-4686(88)85008-4

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1735 / 1741

页数：7

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