SILANE OXIDATION STUDY - ANALYSIS OF DATA FOR SIO2-FILMS DEPOSITED BY LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION

被引：10

作者：

COBIANU, C

PAVELESCU, C

机构：

来源：

THIN SOLID FILMS | 1984年 / 117卷 / 03期

关键词：

D O I：

10.1016/0040-6090(84)90288-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：211 / 216

页数：6

共 19 条

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