DISSOLUTION INHIBITION OF PHENOLIC RESINS BY DIAZONAPHTHOQUINONE - EFFECT OF POLYMER STRUCTURE

被引：8

作者：

HATTORI, T

UENO, T

SHIRAISHI, H

HAYASHI, N

IWAYANAGI, T

机构：

[1] Central Research Laboratory, Hitachi Ltd Kokubunji, Tokyo

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1991年 / 30卷 / 11B期

关键词：

DISSOLUTION INHIBITION; PHENOLIC RESIN; MOLECULAR WEIGHT DISTRIBUTION; POLYHYDROXYSTYRENE DERIVATIVE; DIAZONAPHTHOQUINONE; POSITIVE PHOTORESIST;

D O I：

10.1143/JJAP.30.3125

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In order to understand the basic mechanisms working in the dissolution of phenolic resin/diazonaphthoquinone (DNQ) positive photoresists, several polyhydroxystyrene derivatives have been studied in terms of their dissolution capabilities. The influence of the structure and the molecular weight distributions of phenolic resins on the inhibition effect were examined. In phenolic resins which have alkyl groups ortho to the hydroxy group a strong dissolution inhibition effect is found. As for the molecular weight distribution, the mixtures of a higher-molecular-weight polymer with lower dissolution rate and a lower-molecular-weight polymer with higher dissolution rate give strong dissolution inhibition by DNQ.

引用

页码：3125 / 3131

页数：7

共 15 条

[1]

Arcus R. A., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P124, DOI 10.1117/12.963634

[2]

Hanabata M., 1990, Proceedings of the SPIE - The International Society for Optical Engineering, V1262, P476, DOI 10.1117/12.20102

[3]

Hanabata M., 1988, Proceedings of the SPIE - The International Society for Optical Engineering, V920, P349, DOI 10.1117/12.968335

[4]

Hanabata M., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V771, P85, DOI 10.1117/12.940312

[5]

Hanabata M., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P76, DOI 10.1117/12.963628

[6]

Hanrahan M. J., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V771, P128, DOI 10.1117/12.940317

[7] TETRAHYDROPYRANYL-PROTECTED AND FURANYL-PROTECTED POLYHYDROXYSTYRENE IN CHEMICAL AMPLIFICATION SYSTEMS [J].

HESP, SAM ;

HAYASHI, N ;

UENO, T .

JOURNAL OF APPLIED POLYMER SCIENCE, 1991, 42 (04) :877-883

[8]

Honda K., 1990, Proceedings of the SPIE - The International Society for Optical Engineering, V1262, P493, DOI 10.1117/12.20104

[9] ON THE DISSOLUTION OF NOVOLAK IN AQUEOUS ALKALI [J].

HUANG, JP ;

KWEI, TK ;

REISER, A .

MACROMOLECULES, 1989, 22 (10) :4106-4112

[10]

KISHIMURA S, 1988, 1ST MICR C, P160

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