ELASTORESISTANCE EFFECTS IN EVAPORATED-ANTIMONY FILMS

被引：2

作者：

KOIKE, R

KUROKAWA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1967年 / 6卷 / 04期

关键词：

D O I：

10.1143/JJAP.6.546

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：546 / &

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[1] ELASTORESISTANCE EFFECTS IN EVAPORATED BISMUTH FILMS [J].

KOIKE, R ;

KUROKAWA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1966, 5 (06) :503-&

[2] ELECTRICAL RESISTANCE-STRAIN CHARACTERISTICS OF THIN EVAPORATED METAL FILMS [J].

PARKER, RL ;

KRINSKY, A .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (09) :2700-&

[3] METHOD OF MEASURING AND CONTROLLING EVAPORATION RATES DURING PRODUCTION OF THIN FILMS IN VACUUM [J].

SCHWARZ, H .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1961, 32 (02) :194-&