LASER-SURFACE CLEANING IN AIR - MECHANISMS AND APPLICATIONS

被引：38

作者：

LU, YF

AOYAGI, Y

TAKAI, M

NAMBA, S

机构：

[1] RIKEN, INST PHYS & CHEM RES, SEMICOND LAB, WAKO, SAITAMA 35101, JAPAN

[2] OSAKA UNIV, FAC ENGN SCI, DEPT ELECT ENGN, TOYONAKA, OSAKA 560, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1994年 / 33卷 / 12B期

关键词：

LASER CLEANING; DRY PROCESS; CFC-FREE CLEANING; UV PULSE LASER; SURFACE CLEANING; CLEANING OF MAGNETIC HEAD SLIDERS; METAL SURFACE CLEANING;

D O I：

10.1143/JJAP.33.7138

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Surface contaminations are removed by laser irradiation with pulse output and short wavelength in ambient air. It is a dry cleaning process to remove surface contaminations without using ultrasonic cleaning requiring carbon fluorochloride and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of the laser pulse. Examples of cleaning metal surfaces and magnetic head sliders show that this cleaning process could be widely used in various industrial applications.

引用

页码：7138 / 7143

页数：6

共 41 条

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