THE EFFECT OF TARGET SUBSTRATE COUPLING ON REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING

被引：11

作者：

SCHILLER, S

HEISIG, U

KORNDORFER, C

STRUMPFEL, J

FRACH, P

机构：

来源：

SURFACE & COATINGS TECHNOLOGY | 1989年 / 39卷 / 1-3期

关键词：

D O I：

10.1016/S0257-8972(89)80016-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：549 / 564

页数：16

共 10 条

[1] MECHANISMS OF VOLTAGE-CONTROLLED, REACTIVE, PLANAR MAGNETRON SPUTTERING OF AL IN AR-N2 AND AR-O2 ATMOSPHERES [J].

AFFINITO, J ;

PARSONS, RR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (03) :1275-1284

[2]

FREY H, 1987, DUNNSCHICHTTECHNOLOG, P128

[3] A PHYSICAL MODEL FOR ELIMINATING INSTABILITIES IN REACTIVE SPUTTERING [J].

LARSSON, T ;

BLOM, HO ;

NENDER, C ;

BERG, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03) :1832-1836

[4] TRANSPARENT CONDUCTING ZINC-OXIDE AND INDIUM TIN OXIDE-FILMS PREPARED BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING [J].

MANIV, S ;

MINER, CJ ;

WESTWOOD, WD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03) :1370-1375

[5] DEPOSITION OF HARD WEAR-RESISTANT COATINGS BY REACTIVE DC PLASMATRON SPUTTERING [J].

SCHILLER, S ;

HEISIG, U ;

BEISTER, G ;

STEINFELDER, K ;

STRUMPFEL, J ;

KORNDORFER, C ;

SIEBER, W .

THIN SOLID FILMS, 1984, 118 (03) :255-270

[6] REACTIVE DC HIGH-RATE SPUTTERING AS PRODUCTION TECHNOLOGY [J].

SCHILLER, S ;

HEISIG, U ;

KORNDORFER, C ;

BEISTER, G ;

RESCHKE, J ;

STEINFELDER, K ;

STRUMPFEL, J .

SURFACE & COATINGS TECHNOLOGY, 1987, 33 (1-4) :405-423

[7]

SCHILLER S, 1987, 6TH P INT C IPAT BRI, P23

[8]

SCHILLER S, 1989, 7TH P INT C IPAT GEN

[9]

SPENCER AG, 1987, 6TH P INT C ION PLAS, P1

[10] HIGH-RATE SPUTTERING TECHNIQUES [J].

THORNTON, JA .

THIN SOLID FILMS, 1981, 80 (1-3) :1-11

← 1 →