TANDEM HELIUM PLASMA SPECTROMETRY WITH A CAPACITIVELY COUPLED DISCHARGE FORMED ABOVE A HELIUM ICP

被引:28
作者
CHAN, SK [1 ]
TAN, HM [1 ]
MONTASER, A [1 ]
机构
[1] GEORGE WASHINGTON UNIV,DEPT CHEM,WASHINGTON,DC 20052
关键词
D O I
10.1366/0003702894201770
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:92 / 95
页数:4
相关论文
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