EFFECTS OF BENDING STRESS ON 3 PERCENT GRAIN-ORIENTED SILICON-IRON

被引:1
作者
PERRYMAN, R [1 ]
机构
[1] THAMES POLYTECH,SCH ELECT & ELECTR ENGN,LONDON SE18,ENGLAND
关键词
D O I
10.1088/0022-3727/7/7/311
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1047 / 1052
页数:6
相关论文
共 6 条
[2]   EFFECT OF STRESS ON DOMAIN STRUCTURE OF GOSS TEXTURED SILICON-IRON [J].
CORNER, WD ;
MASON, JJ .
BRITISH JOURNAL OF APPLIED PHYSICS, 1964, 15 (06) :709-&
[3]   DOMAIN PATTERN IN SILICON-IRON UNDER STRESS [J].
DIJKSTRA, LJ ;
MARTIUS, UM .
REVIEWS OF MODERN PHYSICS, 1953, 25 (01) :146-150
[4]   Ferromagnetic colloid for studying magnetic structures [J].
Elmore, WC .
PHYSICAL REVIEW, 1938, 54 (04) :309-310
[5]  
MAPPS DJ, 1969, THESIS U WALES
[6]   POWER LOSSES IN SMALL SAMPLES OF SILICON-IRON [J].
PERRYMAN, R .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1972, 5 (10) :991-&