LEAKAGE-CURRENT INCREASE IN AMORPHOUS TA2O5 FILMS DUE TO PINHOLE GROWTH DURING ANNEALING BELOW 600-DEGREES-C

被引：70

作者：

KIMURA, S

NISHIOKA, Y

SHINTANI, A

MUKAI, K

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 12期

关键词：

D O I：

10.1149/1.2119599

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2414 / 2418

页数：5

共 24 条

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