SURFACE-TENSION OF HE-4 BELOW 0.35 K

被引：7

作者：

EDWARDS, DO ^{[1
]}

FATOUROS, PP ^{[1
]}

IHAS, GG ^{[1
]}

MROZINSKI, P ^{[1
]}

SHEN, SY ^{[1
]}

机构：

[1] OHIO STATE UNIV,DEPT PHYS,COLUMBUS,OH 43210

来源：

PHYSICAL REVIEW B | 1975年 / 11卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.11.4734

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：4734 / 4735

页数：2

相关论文

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