CHEMICAL VAPOR-DEPOSITION OF TITANIUM-OXIDES IN THE COMPOSITION RANGE TIO1.60-TIO1.75

被引：9

作者：

FREDRIKSSON, E

CARLSSON, JO

机构：

[1] Uppsala Univ, Dep of Chemistry,, Solid State Chemistry Group,, Uppsala, Swed, Uppsala Univ, Dep of Chemistry, Solid State Chemistry Group, Uppsala, Swed

来源：

THIN SOLID FILMS | 1985年 / 124卷 / 02期

关键词：

The financial support provided by the Swedish Natural Science Research Council and the Swedish Board for Technical Development is gratefully acknowledged;

D O I：

10.1016/0040-6090(85)90252-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：109 / 116

页数：8

共 8 条

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[2]

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[3]

ERSSON NO, UNPUB COMPUTER PROGR

[4]

FREDRIKSSON E, UNPUB

[5] METAL-INSULATOR TRANSITION IN SELECTED OXIDES [J].

HONIG, JM ;

VANZANDT, LL .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1975, 5 :225-278

[6]

NOLANG B, UNPUB

[7]

STULL D, 1971, NBS NATL STAND REF D, V37

[8] THE FORMATION ENERGY OF CRYSTALLOGRAPHIC SHEAR PLANES IN TINO2N-1 [J].

WOOD, GJ ;

BURSILL, LA .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1981, 375 (1760) :105-125

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