共 1 条
[1]
HEINZ RA, 1978, P SOC PHOTOOPT INSTR, V135, P147
ALIGNING LITHOGRAPHY ON OPPOSITE SURFACES OF A SUBSTRATE
被引：4
作者：
EVERETT, PN
DELANEY, WF
机构：
[1] Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, MA, 02173-9108
来源：
APPLIED OPTICS
|
1992年
/
31卷
/
34期
关键词：
REGISTRATION;
ALIGNING;
LITHOGRAPHY;
BACK TO FRONT;
TOP TO BOTTOM;
2-SIDED;
OPTICAL;
D O I：
10.1364/AO.31.007292
中图分类号：
O43 [光学];
学科分类号：
070207 ;
0803 ;
摘要：
Equipment has been developed for aligning lithographic features between opposite surfaces of substrates to within 1 mum. It will work with opaque substrates and allows registration to existing features on the other surface.
引用
收藏
页码：7292 / 7294
页数：3
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