PRESSURE-INDUCED CHANGES IN LIII X-RAY-ABSORPTION NEAR-EDGE STRUCTURE OF CEO2 AND CEF4 - RELEVANCE TO 4F-ELECTRONIC STRUCTURE

被引：111

作者：

KAINDL, G ^{[1
]}

SCHMIESTER, G ^{[1
]}

SAMPATHKUMARAN, EV ^{[1
]}

WACHTER, P ^{[1
]}

机构：

[1] SWISS FED INST TECHNOL,FESTKORPERPHYS LAB,CH-8093 ZURICH,SWITZERLAND

来源：

PHYSICAL REVIEW B | 1988年 / 38卷 / 14期

关键词：

D O I：

10.1103/PhysRevB.38.10174

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：10174 / 10177

页数：4

共 21 条

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