EFFECT OF AU NUCLEATION CENTERS AND DEPOSITION RATE ON CRYSTALLINITY AND ELECTRONIC PROPERTIES OF EVAPORATED TE FILMS

被引：26

作者：

OKUYAMA, K ^{[1
]}

YAMAMOTO, H ^{[1
]}

KUMAGAI, Y ^{[1
]}

机构：

[1] YAMAGATA UNIV,FAC ENGN,YONEZAWA,JAPAN

来源：

关键词：

D O I：

10.1063/1.322247

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：105 / 111

页数：7

共 6 条

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DUTTON, RW ;

MULLER, RS .

PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (10) :1511-+

[2] LARGE GRAIN TELLURIUM THIN-FILMS [J].

DUTTON, RW ;

MULLER, RS .

[3]

KAMIYAMA M, 1964, HDB THIN FILM TECHNO, P1

[4] HALL-MOBILITY OF EVAPORATED TELLURIUM-FILMS [J].

OKUYAMA, K ;

KUMAGAI, Y .

[5]

Richter H, 1943, PHYS Z, V44, P406

[6] STRUCTURE AND GROWTH OF ORIENTED TELLURIUM THIN FILMS [J].

WEIDMANN, EJ ;

ANDERSON, JC .