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MASS-FLOW CHARACTERISTICS OF IMPLODING THIN-FILM PLASMA ATOM CELLS
被引:6
作者
:
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
GOLDBERG, JM
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
CARNEY, KP
机构
:
来源
:
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
|
1990年
/ 45卷
/ 10期
关键词
:
D O I
:
10.1016/0584-8547(90)80179-M
中图分类号
:
O433 [光谱学];
学科分类号
:
0703 ;
070302 ;
摘要
:
引用
收藏
页码:1177 / 1186
页数:10
相关论文
共 9 条
[1]
ANALYTICAL CHARACTERIZATION OF AN IMPLODING THIN-FILM PLASMA USING SPATIALLY AND TEMPORALLY RESOLVED SPECTROMETRY
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
CARNEY, KP
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
GOLDBERG, JM
[J].
ANALYTICAL CHEMISTRY,
1986,
58
(14)
: 3115
-
3121
[2]
PRODUCTION AND INITIAL CHARACTERIZATION OF AN IMPLODING THIN-FILM PLASMA SOURCE FOR ATOMIC SPECTROMETRY
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
CARNEY, KP
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
GOLDBERG, JM
[J].
ANALYTICAL CHEMISTRY,
1986,
58
(14)
: 3108
-
3115
[3]
CHEN F, 1974, INTRO PLASMA PHYSICS
[4]
EXPANSION DYNAMICS AND VAPOR LOSS PROCESSES IN ELECTRICALLY VAPORIZED THIN-FILM ATOMIZATION CELLS
COLLINS, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
COLLINS, RJ
SACKS, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, RD
[J].
ANALYTICAL CHEMISTRY,
1983,
55
(13)
: 2036
-
2043
[5]
GOLDBERG J, UNPUB
[6]
ELECTRICAL CHARACTERISTICS OF IMPLODING THIN-FILM PLASMA ATOM CELLS
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
GOLDBERG, JM
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
CARNEY, KP
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1990,
45
(10)
: 1167
-
1175
[7]
GOLDBERG JM, UNPUB SPECTROCHIM AC
[8]
OKEEFE JD, 1964, EXPLODING WIRES, V3, P211
[9]
SCHERRER VE, 1962, EXPLODING WIRES, V2, P235
←
1
→
共 9 条
[1]
ANALYTICAL CHARACTERIZATION OF AN IMPLODING THIN-FILM PLASMA USING SPATIALLY AND TEMPORALLY RESOLVED SPECTROMETRY
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
CARNEY, KP
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
UNIV VERMONT,DEPT CHEM,BURLINGTON,VT 05405
GOLDBERG, JM
[J].
ANALYTICAL CHEMISTRY,
1986,
58
(14)
: 3115
-
3121
[2]
PRODUCTION AND INITIAL CHARACTERIZATION OF AN IMPLODING THIN-FILM PLASMA SOURCE FOR ATOMIC SPECTROMETRY
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
CARNEY, KP
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
UNIV VERMONT,DEPT MED,BURLINGTON,VT 05405
GOLDBERG, JM
[J].
ANALYTICAL CHEMISTRY,
1986,
58
(14)
: 3108
-
3115
[3]
CHEN F, 1974, INTRO PLASMA PHYSICS
[4]
EXPANSION DYNAMICS AND VAPOR LOSS PROCESSES IN ELECTRICALLY VAPORIZED THIN-FILM ATOMIZATION CELLS
COLLINS, RJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
COLLINS, RJ
SACKS, RD
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
UNIV MICHIGAN,DEPT CHEM,ANN ARBOR,MI 48109
SACKS, RD
[J].
ANALYTICAL CHEMISTRY,
1983,
55
(13)
: 2036
-
2043
[5]
GOLDBERG J, UNPUB
[6]
ELECTRICAL CHARACTERISTICS OF IMPLODING THIN-FILM PLASMA ATOM CELLS
GOLDBERG, JM
论文数:
0
引用数:
0
h-index:
0
GOLDBERG, JM
CARNEY, KP
论文数:
0
引用数:
0
h-index:
0
CARNEY, KP
[J].
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY,
1990,
45
(10)
: 1167
-
1175
[7]
GOLDBERG JM, UNPUB SPECTROCHIM AC
[8]
OKEEFE JD, 1964, EXPLODING WIRES, V3, P211
[9]
SCHERRER VE, 1962, EXPLODING WIRES, V2, P235
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1
→