SCHOTTKY FIELD EMISSION THROUGH INSULATING LAYERS

被引:75
作者
POLLACK, SR
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10.1063/1.1729554
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O59 [应用物理学];
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页码:877 / &
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[1]   ELECTRON AND PHOTOCURRENTS IN THIN FILMS OF ZIRCONIUM OXIDE [J].
CHARLESBY, A .
ACTA METALLURGICA, 1953, 1 (03) :348-354
[2]   ELECTRICAL PROPERTIES OF EVAPORATED ALUMINUM OXIDE FILMS [J].
DASILVA, EM ;
WHITE, P .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (01) :12-15
[3]   SCHOTTKY EMISSION THROUGH THIN INSULATING FILMS [J].
EMTAGE, PR ;
TANTRAPORN, W .
PHYSICAL REVIEW LETTERS, 1962, 8 (07) :267-&
[4]   TUNNELING THROUGH THIN INSULATING LAYERS [J].
FISHER, JC ;
GIAEVER, I .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) :172-&
[5]   FIELD EMISSION FROM METALS INTO ALKALI HALIDE CRYSTALS [J].
GELLER, M .
PHYSICAL REVIEW, 1956, 101 (06) :1685-1693
[6]   THE ELECTRIC TUNNEL EFFECT ACROSS THIN INSULATOR FILMS IN CONTACTS [J].
HOLM, R .
JOURNAL OF APPLIED PHYSICS, 1951, 22 (05) :569-574
[7]   OPERATION OF TUNNEL-EMISSION DEVICES [J].
MEAD, CA .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (04) :646-&
[8]  
POLLACK S, TO BE PUBLISHED
[9]  
POLLACK SR, 1962, J ELECTROCHEM SOC, V109, pC63
[10]   ION SIZE EFFECT AND MECHANISM OF ELECTROLYTIC RECTIFICATION [J].
SCHMIDT, PF ;
HUBER, F ;
SCHWARZ, RF .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 15 (3-4) :270-290