FLUX GROWTH OF GALLIUM ANALOG OF BETA-AL2O3

被引：7

作者：

FOSTER, LM ^{[1
]}

SCARDEFIELD, JE ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 01期

关键词：

D O I：

10.1149/1.2132748

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：141 / 142

页数：2

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