CARBON DIFFUSION IN UNCOATED AND TITANIUM NITRIDE COATED IRON SUBSTRATES DURING MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR-DEPOSITION OF DIAMOND

被引：51

作者：

WEISER, PS

PRAWER, S

HOFFMAN, A

MANORY, RR

PATERSON, PJK

STUART, SA

机构：

[1] TECHNION ISRAEL INST TECHNOL,DEPT CHEM,IL-32000 HAIFA,ISRAEL

[2] ROYAL MELBOURNE INST TECHNOL,DEPT APPL PHYS,MELBOURNE,VIC 3001,AUSTRALIA

来源：

JOURNAL OF APPLIED PHYSICS | 1992年 / 72卷 / 10期

关键词：

D O I：

10.1063/1.352119

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Auger electron spectroscopy has been employed to investigate the effectiveness of thin films of TiN as barriers to carbon diffusion during chemical vapor deposition (CVD) of diamond onto Fe substrates. Auger depth profiling was used to monitor the C concentration in the TiN layer, through the interface and into the substrate both before and after CVD diamond deposition. The results show that a layer of TiN only 250 angstrom thick is sufficient to inhibit soot formation on the Fe surface and C diffusion into the Fe bulk.

引用

页码：4643 / 4647

页数：5

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