DTA AND X-RAY STUDIES OF ELECTROLESS NICKEL

被引：63

作者：

RANDIN, JP

MAIRE, PA

SAURER, E

HINTERMANN, HE

机构：

来源：

关键词：

D O I：

10.1149/1.2426623

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：442 / +

页数：1

共 11 条

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[3] STRUCTURE OF CHEMICALLY DEPOSITED NICKEL
GOLDENSTEIN, AW
ROSTOKER, W
SCHOSSBERGER, F
GUTZEIT, G
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (02) : 104 - 110
[4] STRUCTURE OF ELECTROLESS NICKEL
GRAHAM, AH
LINDSAY, RW
READ, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) : 1200 - 1201
[5] STRUCTURE AND MECHANICAL PROPERTIES OF ELECTROLESS NICKEL
GRAHAM, AH
LINDSAY, RW
READ, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) : 401 - &
[6] Gutzeit G., 1959, PLATING, V46, P1158
[7] PEARSON WB, 1958, HANDB LATTICE SPA, P594
[8] RANDIN JP, TO BE PUBLISHED
[9] VANROYEN, 1957, ELECTROPLATING METAL, P114
[10] Weibke F., 1941, Z ELEKTROCHEM, V47, P222