THE C-V METHOD FOR CHARACTERIZING ISFET OR EOS DEVICES WITH ION-SENSITIVE MEMBRANES

被引:26
作者
FABRY, P
LAURENTYVONNOU, L
机构
[1] Laboratoire d'Ionique et d'Electrochimie du Solide de Grenoble (URA D1213), ENSEEG, 38402 Saint Martin d'Heres Cedex
来源
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1990年 / 286卷 / 1-2期
关键词
D O I
10.1016/0022-0728(90)85062-A
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
AgCI layers have been used as an example to show that the characteristic impedance of the layer material interferes with space-charge capacitance measurements of EOS devices. Correction methods are proposed to evaluate the flat band voltage accurately. The impedance characteristics of silver chloride are consistent with literature data but a significant difference is observed between the apparent and the real geometrical factors specific to the deposition conditions. Experimental results demonstrate the need for a thermodynamically reversible cell for measuring Cl- concentration. © 1990.
引用
收藏
页码:23 / 40
页数:18
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