2-PHOTON-INDUCED BIREFRINGENCE IN POLYSILANES

被引：24

作者：

SCHELLENBERG, FM ^{[1
]}

BYER, RL ^{[1
]}

MILLER, RD ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

CHEMICAL PHYSICS LETTERS | 1990年 / 166卷 / 04期

关键词：

D O I：

10.1016/0009-2614(90)85039-F

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Chain scission induced by two-photon exposure produces a permanent birefringence in polysilane polymer films, which can be used for the formation of birefringent optical elements. Spectroscopy of the effect for poly(di-n-hexylsilane) reveals an unexpected sharp resonance at 580 nm. A comparison of several polysilanes indicates the effect only occurs in polymers with symmetric or near symmetric sidegroups. Models to explain these observations are introduced and discussed. © 1990.

引用

页码：331 / 339

页数：9

共 33 条

[1] TEMPERATURE-DEPENDENCE OF THE 3RD-ORDER NONLINEAR OPTICAL SUSCEPTIBILITIES IN POLYSILANES AND POLYGERMANES [J].