PRECISE MEASUREMENT OF THERMAL-EXPANSION OF SILICON NEAR 40DEGREESC

被引：16

作者：

NORTON, MA

BERTHOLD, JW

JACOBS, SF

PLUMMER, WA

机构：

[1] UNIV ARIZONA,OPTICAL SCI CTR,TUCSON,AZ 85721

[2] CORNING GLASS WORKS,CORNING,NY 14830

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 04期

关键词：

D O I：

10.1063/1.322792

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1683 / 1685

页数：3

共 15 条

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[8] ULTRAPRECISE MEASUREMENT OF THERMAL COEFFICIENTS OF EXPANSION [J].

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[9]

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[10] THERMAL EXPANSION OF SILICON [J].

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