EFFECTS OF THIOUREA AND GUANIDINE-HYDROCHLORIDE ON ELECTROLESS COPPER PLATING

被引：43

作者：

HUNG, A

机构：

来源：

关键词：

D O I：

10.1149/1.2114012

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1047 / 1049

页数：3

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