COMPARATIVE-STUDY OF MICROFIELD NONUNIFORMITY IN PLASMAS

Recent general theoretical approaches to the problem of the microfield nonuniformity in plasmas are summarized in the context of their applications to the emission or absorption shape of the spectral lines arising from atoms immersed in a plasma. The calculations of the microfield distribution function and the universal functions, which define the constraint moments of the components of the nonuniformity microfield tenser, are performed for various plasma conditions. The results obtained on the basis of the generalized Baranger-Mozer cluster expansion scheme, the generalized Adjustable Parameter Exponential Approximation and Monte Carlo simulations are compared. This study provides the groundwork for improved calculations of the line profile that account for plasma microfield nonuniformity.