PHOTON EXCITATION OF SURFACE PLASMONS - ANALYSIS OF DATA FOR AI

被引：11

作者：

WILLIAMS, MW

ARAKAWA, ET

EMERSON, LC

机构：

来源：

SURFACE SCIENCE | 1967年 / 6卷 / 01期

关键词：

D O I：

10.1016/0039-6028(67)90019-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：127 / &

共 9 条

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[2]

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[4] ON VACUUM-ULTRAVIOLET REFELECTANCE OF EVAPORATED ALUMINUM BEFORE AND DURING OXIDATION [J].

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HASS, G ;

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[5] EFFECT OF OXIDATION ON THE CHARACTERISTIC LOSS SPECTRA OF ALUMINUM AND MAGNESIUM [J].

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SWAN, JB .

PHYSICAL REVIEW, 1960, 118 (03) :640-643

[6] PLASMA LOSSES BY FAST ELECTRONS IN THIN FILMS [J].

RITCHIE, RH .

PHYSICAL REVIEW, 1957, 106 (05) :874-881

[7] PHOTON EXCITATION OF SURFACE PLASMONS [J].

RITCHIE, RH .

SURFACE SCIENCE, 1965, 3 (05) :497-&

[8]

VEHSE RC, 1966, B AM PHYS SOC, V11, P348

[9]

VEHSE RC, ACCEPTED FOR PUBLICA

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