MICROSTRUCTURE OF EPITAXIAL YBA2CU3O7 FILMS ON STEP-EDGE SRTIO3 SUBSTRATES

被引：132

作者：

JIA, CL ^{[1
]}

KABIUS, B ^{[1
]}

URBAN, K ^{[1
]}

HERRMAN, K ^{[1
]}

CUI, GJ ^{[1
]}

SCHUBERT, J ^{[1
]}

ZANDER, W ^{[1
]}

BRAGINSKI, AI ^{[1
]}

HEIDEN, C ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH GMBH,INST SCHICHT & IONENTECH,W-5170 JULICH,GERMANY

来源：

PHYSICA C | 1991年 / 175卷 / 5-6期

关键词：

D O I：

10.1016/0921-4534(91)90263-X

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The microstructure of YBa2Cu3O7 films epitaxially grown on step-edge (100) SrTiO3 substrates has been characterized by means of high resolution transmission electron microscopy. The results indicate a relationship between the microstructure of the film across a step and the angle the step makes with the substrate plane. On a steep, high-angle step, the film grows with its c-axis perpendicular to that of the film on the substrate surface so that two grain boundaries are formed. On a low-angle step; the film grows without any change in c-axis orientation across the step and without grain boundaries. Epitaxial second phases intergrowths across the steps have been found in some cases which may act as barrier layers when they cut through the YBa2Cu3O7 film.

引用

页码：545 / 554

页数：10

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