RADIATION ANNEALING IN NICKEL AND COPPER BY 100 MEV IODINE IONS

被引:13
作者
IWASE, A [1 ]
IWATA, T [1 ]
SASAKI, S [1 ]
NIHIRA, T [1 ]
机构
[1] IBARAKI UNIV,FAC ENGN,HITACHI,IBARAKI 316,JAPAN
关键词
electron-phonon interaction; electronic excitation; nickel and copper; radiation annealing;
D O I
10.1143/JPSJ.59.1451
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Radiation annealing by 100 MeV 127I-ions is studied in pre-doped Ni and Cu samples through the defect production rate measurements below 10 K. The experimental results are analyzed by using a new model which describes the production and radiation annealing of two or more types of defects. The subthreshold recombination cross section and the concentration of doped-in defects are obtained for each type of defects. In Ni, the defect annihilation corresponding to the stage-I thermal annealing occurs during the I-ion irradiation with the subthreshold recombination cross section of 6.5×10-12 to 1.4×10-12cm2. In Cu, the stage-I defects are annihilated with the cross section of 4.6×10-13cm2. The large radiation annealing in Ni shows the contribution of the electron excitation by irradiating ions to the subthreshold recombination of defects through the electron-phonon interaction. © 1990, THE PHYSICAL SOCIETY OF JAPAN. All rights reserved.
引用
收藏
页码:1451 / 1457
页数:7
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