MAGNETIC-FIELD GRADIENT EFFECTS ON ION ENERGY FOR ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA STREAM

被引:115
作者
MATSUOKA, M
ONO, KI
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1988年 / 6卷 / 01期
关键词
D O I
10.1116/1.574990
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:25 / 29
页数:5
相关论文
共 11 条
[1]  
Bunshah R. F., 1982, DEPOSITION TECHNOLOG
[2]  
KONDO N, 1987, 11TH P S ION SOURC I, P333
[3]   LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
MATSUO, S ;
KIUCHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L210-L212
[4]  
MATSUO S, 1986, 10TH P S ION SOURC I, P471
[5]  
MATSUO S, 1982, JPN J APPL PHYS, V21, pL2
[6]   LOW-ENERGY ION EXTRACTION WITH SMALL DISPERSION FROM AN ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA STREAM [J].
MATSUOKA, M ;
ONO, K .
APPLIED PHYSICS LETTERS, 1987, 50 (26) :1864-1866
[7]  
ONO T, 1986, J VAC SCI TECHNOL B, V4, P696, DOI 10.1116/1.583599
[8]   ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING [J].
ONO, T ;
TAKAHASHI, C ;
MATSUO, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (08) :L534-L536
[9]  
SHIMADA M, 1986, 10TH P S ISIAT 86 TO, P131
[10]  
Vossen J.L., 1978, THIN FILM PROCESSES