EFFECTIVE POTENTIALS FOR KINETIC PROCESSES ON SEMICONDUCTOR SURFACES

被引：7

作者：

YING, SC ^{[1
]}

REINECKE, TL ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1984年 / 2卷 / 03期

关键词：

D O I：

10.1116/1.582840

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：573 / 575

页数：3

共 22 条

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