FORMATION OF RUTILE TIO2 INDUCED BY HIGH-DOSE O+-IMPLANTATION AND ITS CHARACTERISTICS

被引：18

作者：

OKABE, Y

IWAKI, M

TAKAHASHI, K

OHIRA, S

CRIST, BV

机构：

[1] SAITAMA INST TECHNOL,FAC ENGN,DEPT ELECTR ENGN,OKABE,SAITAMA 36902,JAPAN

[2] NIKKEI TECHNORES CO LTD,SHIZUOKA 42132,JAPAN

[3] HAKUTO CO LTD,SHINJUKU KU,TOKYO 160,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90861-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：619 / 622

页数：4

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